Integration with ENOVIA Version 6 Enables Complex IC Design Data to be Managed in Familiar EDA Environment.
SAN DIEGO — Dassault Systèmes announced today the launch of a new integration with Synopsys, a world leader in electronic design automation (EDA). The ENOVIA DesignSync for Synopsys’ Galaxy Custom Designer mixed-signal implementation solution integrates the powerful design data management (DDM) capabilities of both ENOVIA DesignSync Data Manager and ENOVIA DesignSync Central within the Synopsys Custom Designer environment. Combined with the existing DesignSync integration to the Synopsys Galaxy products, this enables customers to manage all of their integrated circuit (IC) design data from Synopsys and non-Synopsys tools within a single, collaborative platform.
“Through this collaboration, we have delivered an integrated solution that provides mutual customers with a productive custom design environment combined with Dassault Systèmes’ DDM capabilities,” said Farhad Hayat, senior director of product marketing at Synopsys. “The seamless and straightforward integration is a testament to Custom Designer’s open and standards-based environment.”
Data created and modified by EDA tools, such as a schematic diagram or physical layout, is typically not stored on disk as a single file—but rather, as a specific set of files. In order for a design data management system to maintain a version history of changes to the design objects, this set of files must be managed as a group. This is what makes the library recognition and processing features of ENOVIA DesignSync for Synopsys Custom Designer such a key feature. DesignSync’s unique “EDA data-awareness” technology affirms Dassault Systèmes commitment to openness by recognizing this complex data from various best-in-class EDA products and treats it as a single coherent object, rather than a collection of individual files the way that other DDM systems do.
With this solution, Synopsys library directory structures and data types are recognized as such. Users manipulate familiar constructs such as cells or views, while the tool automatically processes the underlying files and directories which comprise data views. Designers need not be concerned with detailed version control bookkeeping as it is handled automatically.
“ENOVIA DesignSync’s collaborative IC design data management solutions continue to lead the market because of their proven-in-production value, openness and scalability,” added Rick Stanton, director of Semiconductor Market Strategy, ENOVIA, Dassault Systèmes. “With the Custom Designer integration, we have made it easier for designers to concentrate on what’s most important – design and innovation – while taking the worry out of how to share, integrate and release data across their local and geographically distributed design teams. Our customers will be able to work with all available information at the same time, improving efficiency and moving even closer to becoming a full multi-discipline design operation.”
Dassault Systèmes will be attending this year’s DAC 2011 event at the San Diego Convention Center from June 5-9, 2011. The company will be available at booth number 1625 to showcase the new ENOVIA DesignSync for Synopsys Custom Designer and its other leading solutions for the semiconductor and high-tech electronics industry.
Jun 7, 2011
- EDS Technologies Signs MoU With Mar Baselios College Of Engineering
- Delcam's new web site for PartMaker CAM system for production machining
- COMET robot machining consortium meets at Fraunhofer
- Surfware Appoints David Holding Company as New VAR in Bulgaria & Romania
- Panso Solutions of India Joins the Aras Partner Program
- Delcam launches DentSCAN dental scanner
- Rapiscan Uses Autodesk Vault to Effectively Collaborate on Security Products
- Delcam's ArtCAM speeds ice bar production
- InventorCAM 2012 makes its debut, reducing cycle times by up to 70% for Autodesk customers, with iMachining
- SigmaNEST Delivers Results to Tampa Bay Steel